4WAVE INC

  • 4Wave Ion Beam Cluster Tool

    4Wave’s cluster tool is the premier Sputtering system. The platform incorporates the most advanced engineering for performance and uptime. It is fully computer controlled featuring advanced wafer scheduling and LOT management. The 4Wave cluster tool addresses the highest performance in markets including MEMS, Thin Film Optics, Semiconductor and Data Storage.


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  • 4Wave Laboratory Alloy-Nanolayer System

    The Laboratory Alloy and Nanolayer System (LANS) is 4Wave’s Flagship R&D system. This system has received wide acceptance in the academic materials research world. Equipped with multiple processing targets, it is a very versatile platform for multilayer material synthesis and compositional nanotechnology.


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  • 4Wave Load Lock Etch System

    The 4Wave Load Lock Etch System is a flagship product addressing several significant markets. This system boasts high performance etching, critical thin film profile milling, glancing angle milling, etc. 4Wave Single Wafer Load Lock Etching Systems addresses the needs of customers seeking a flexible, cost-effective, small-footprint, ion-etching/ion processing workhorse for general purpose research and production applications.


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  • 4Wave Planetary Etch System

    The 4Wave Planetary Etch System expands the 4Wave LL Etch system to include 3 processing stages for high throughput.


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  • 4Wave Z-Flex

    4Wave’s Z-Flex tool is a versatile platform with the capability of performing Ion Beam Etching (IBE, RIE, CAIBE) and Ion Beam Deposition (IBD) or Biased Target Deposition (IBS) in a common vacuum environment. It is fully computer controlled featuring a single wafer transfer system. The Z-Flex platform can also be incorporated in the 4Wave Cluster Tool. It has a large application base in markets including MEMS, Thin film optics, Semiconductor and Data Storage.


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